INTRODUCTORY COMMENTS

Many inappropriate business decisions have been made because the basic physics of real optical image formation has not been properly understood. This has led to ineffectual technical achievement and extreme expense.

Real image formation is ordinarily assumed to occur as a result of light propagating away from a single object point. However, light that forms real images is necessarily transmitted away from pairs of object points.

RIF is achieved by using a reference distribution of light in addition to the usual subject distribution of light. This assures that two well-separated illuminated object points are used to form light waves that propagate away from the object plane and ultimately contributes to image formation.

RIF-based real image formation holds the promise of providing advanced technical achievement at relatively modest cost.

NANOLITHOGRAPHY

Nanolithography constitutes a good example of ineffectual technical achievement coupled with extreme expense. The following excerpt from a report published (March 2009) by Griff Resor[i] supports this statement:

"Even if EUV can be ready in time (Gen 1 units in 2010, Gen 2 units in 2011), will they be economical? ASML, Nikon, and SEMATECH have presented separate analyses, all showing the same general picture that EUV will be cheaper than 193i using double exposure at the 22nm node. This is true even when an $89 million price is assumed for the EUV tool (vs. $52 million for the 193i tool), EUV output is only 100wph vs. 200wph for the optical tools, and mask blanks cost $60K for EUV vs.$3K-$5K for optical mask blanks."

This view is strongly reinforced, in a less technical manner, by a feature article published (April 2009) in The Economist[ii].

Not understanding the basic physics of optical image formation has led to ineffectual and extremely expensive nanolithography methods. RIF-based nanolithography is expected to achieve advanced nanolithography at reasonable cost. With appropriate partner involvement, this new technology could easily be ready in time for Gen 1 units in 2010 and Gen 2 units in 2011.

MICROSCOPY

Full color optical microscopy with no fundamental resolution limit is expected to be achievable by means of RIF. Expectations are that RIF-based optical microscopy can be developed to exceed the technical capabilities of all alternative microscopy technologies.

The resolution needed for RIF-based optical microscopy has been demonstrated. Magnification and image recording methods that are suitable for use with such microscopy are currently being developed. With appropriate partner participation, the time to market for RIF-based microscopes should not exceed one year.

GHOST IMAGING AND QUANTUM ENTANGLEMENT

RIF is rooted in quantum entanglement and involves quantum entanglement in a very fundamental way.

RIF is an advanced form of ghost imaging.